International Journal of Advances in Electronics Engineering
Author(s) : MANISHA PATTANAIK, NEERAJ KR. SHUKLA, R.K.SINGH, S.BIRLA, SVEEN NAGPAL
Exponential growth of battery powered portable applications demanding new SRAM cell topologies with low-leakage. In this work, an analysis and simulation on P-P-N based 10T SRAM cell using dual-Vth scheme (at deep sub-micron technology) is presented. This work achieved stand-by leakage reduced by 74% and 77% at VDD=0.8V and VDD=0.7V respectively without losing cells performance at an area power trade-off. The simulation is being performed at 45nm CMOS technology, Vthn=0.22V, Vthp=0.224V, VDD=0.7 and 0.8V, and at T=270C.